검색결과 : 22건
| No. | Article |
|---|---|
| 1 |
Effect of pressure on direct synthesis of DME from syngas over metal-pillared ilerites and metal/metal-pillared ilerites Ahn SH, Kim SH, Jung KB, Hahm HS Korean Journal of Chemical Engineering, 25(3), 466, 2008 |
| 2 |
Long term stability of dry etched magnetoresistive random access memory elements Jung KB, Marburger J, Sharifi F, Park YD, Lambers ES, Pearton SJ Journal of Vacuum Science & Technology A, 18(1), 268, 2000 |
| 3 |
Comparison of plasma chemistries for dry etching of Ta2O5 Lee KP, Jung KB, Singh RK, Pearton SJ, Hobbs C, Tobin P Journal of Vacuum Science & Technology A, 18(4), 1169, 2000 |
| 4 |
Comparative study of Ni nanowires patterned by electron-beam lithography and fabricated by lift-off and dry etching techniques Park YD, Jung KB, Overberg M, Temple D, Pearton SJ, Holloway PH Journal of Vacuum Science & Technology B, 18(1), 16, 2000 |
| 5 |
Inductively coupled plasma etching in ICl- and IBr-based chemistries. Part I: GaAs, GaSb, and AlGaAs Hahn YB, Hays DC, Cho H, Jung KB, Lambers ES, Abernathy CR, Pearton SJ, Hobson WS, Shul RJ Plasma Chemistry and Plasma Processing, 20(3), 405, 2000 |
| 6 |
Inductively coupled plasma etching in ICl- and IBr-based chemistries. Part II: InP, InSb, InGaP, and InGaAs Hahn YB, Hays DC, Cho H, Jung KB, Lambers ES, Abernathy CR, Pearton SJ, Hobson WS, Shul RJ Plasma Chemistry and Plasma Processing, 20(3), 417, 2000 |
| 7 |
GaN/AlGaN HBT fabrication Ren F, Han J, Hickman R, Van Hove JM, Chow PP, Klaassen JJ, LaRoche JR, Jung KB, Cho H, Cao XA, Donovan SM, Kopf RF, Wilson RG, Baca AG, Shul RJ, Zhang L, Willison CG, Abernathy CR, Pearton SJ Solid-State Electronics, 44(2), 239, 2000 |
| 8 |
GaNPN junction issues and developments Hickman R, Van Hove JM, Chow PP, Klaassen JJ, Wowchak AM, Polley CJ, King DJ, Ren F, Abernathy CR, Pearton SJ, Jung KB, Cho H, La Roche JR Solid-State Electronics, 44(2), 377, 2000 |
| 9 |
Comparison of Cl-2/He, Cl-2/Ar, and Cl-2/Xe plasma chemistries for dry etching of NiFe and NiFeCo Jung KB, Cho H, Hahn YB, Hays DC, Lambers ES, Park YD, Feng T, Childress JR, Pearton SJ Journal of the Electrochemical Society, 146(4), 1465, 1999 |
| 10 |
Parametric study of NiFe and NiFeCo high density plasma etching using CO/NH3 Jung KB, Hong J, Cho H, Onishi S, Johnson D, Park YD, Childress JR, Pearton SJ Journal of the Electrochemical Society, 146(6), 2163, 1999 |