검색결과 : 11건
| No. | Article |
|---|---|
| 1 |
Characterization of bending in single crystal Si beams and resonators Weigold JW, Juan WH, Pang SW, Borenstein JT Journal of Vacuum Science & Technology B, 17(4), 1336, 1999 |
| 2 |
Dry etching of deep Si trenches for released resonators in a Cl-2 plasma Weigold JW, Juan WH, Pang SW Journal of the Electrochemical Society, 145(5), 1767, 1998 |
| 3 |
Etching and Boron-Diffusion of High-Aspect-Ratio Si Trenches for Released Resonators Weigold JW, Juan WH, Pang SW Journal of Vacuum Science & Technology B, 15(2), 267, 1997 |
| 4 |
Etching of High-Aspect-Ratio Microgravity Structures in InP Ying F, Juan WH, Pang SW Journal of Vacuum Science & Technology B, 15(3), 665, 1997 |
| 5 |
High reflectivity micromirrors fabricated by coating high aspect ratio Si sidewalls Juan WH, Kao YH, Pang SW Journal of Vacuum Science & Technology B, 15(6), 2661, 1997 |
| 6 |
Control of Etch Profile for Fabrication of Si Microsensors Juan WH, Pang SW Journal of Vacuum Science & Technology A, 14(3), 1189, 1996 |
| 7 |
Controlling Sidewall Smoothness for Micromachined Si Mirrors and Lenses Juan WH, Pang SW Journal of Vacuum Science & Technology B, 14(6), 4080, 1996 |
| 8 |
High-Aspect-Ratio Si Etching for Microsensor Fabrication Juan WH, Pang SW Journal of Vacuum Science & Technology A, 13(3), 834, 1995 |
| 9 |
Dependence of Etch Characteristics on Charge Particles as Measured by Langmuir Probe in a Multipolar Electron-Cyclotron-Resonance Source Sung KT, Juan WH, Pang SW, Dahimene M Journal of Vacuum Science & Technology A, 12(1), 69, 1994 |
| 10 |
High-Aspect-Ratio Polyimide Etching Using an Oxygen Plasma Generated by Electron-Cyclotron-Resonance Source Juan WH, Pang SW Journal of Vacuum Science & Technology B, 12(1), 422, 1994 |