화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Atomic-scale depth profiling of composition, chemical structure and electronic band structure of La2O3/Si(100) interfacial transition layer
Nohira H, Shiraishi T, Takahashi K, Hattori T, Kashiwagi I, Ohshima C, Ohmi S, Iwai H, Joumori S, Nakajima K, Suzuki M, Kimura K
Applied Surface Science, 234(1-4), 493, 2004
2 Characterization of HfO2/Si(001) interface with high-resolution Rutherford backscattering spectroscopy
Nakajima K, Joumori S, Suzuki M, Kimura K, Osipowicz T, Tok KL, Zheng JZ, See A, Zhang BC
Applied Surface Science, 237(1-4), 416, 2004