검색결과 : 19건
No. | Article |
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1 |
Preparation by electrophoretic deposition of molybdenum iodide cluster-based functional nanostructured photoelectrodes for solar cells Renaud A, Nguyen TKN, Grasset F, Raissi M, Guillon V, Delabrouille F, Dumait N, Jouan PY, Cario L, Jobic S, Pellegrin Y, Odobel F, Cordier S, Uchikoshi T Electrochimica Acta, 317, 737, 2019 |
2 |
Synchrotron Radiation Applied to Real-Time Studies of the Kinetics of Growth of Aluminum Nitride Thin Multilayers Molleja JG, Burgi J, Kellermann G, Craievich A, Neuenschwander R, Jouan PY, Djouadi MA, Piccoli M, Bemporad E, De Felicis D, Feugeas JN Journal of Physical Chemistry B, 123(7), 1679, 2019 |
3 |
Electrochemical characteristics of NixN thin films deposited by DC and HiPIMS reactive magnetron sputtering Keraudy J, Athouel L, Hamon J, Girault B, Gloaguen D, Richard-Plouet M, Jouan PY Thin Solid Films, 669, 659, 2019 |
4 |
Phase separation within NiSiN coatings during reactive HiPIMS discharges: A new pathway to grow NixSi nanocrystals composites at low temperature Keraudy J, Boyd RD, Shimizu T, Helmersson U, Jouan PY Applied Surface Science, 454, 148, 2018 |
5 |
Nitrogen doping on NiO by reactive magnetron sputtering: A new pathway to dynamically tune the optical and electrical properties Keraudy J, Ferrec A, Richard-Plouet M, Hamon J, Goullet A, Jouan PY Applied Surface Science, 409, 77, 2017 |
6 |
Mass spectrometry analyzes to highlight differences between short and long HiPIMS discharges Ferrec A, Keraudy J, Jouan PY Applied Surface Science, 390, 497, 2016 |
7 |
Structural, morphological and electrical properties of nickel oxide thin films deposited by reactive sputtering Keraudy J, Molleja JG, Ferrec A, Corraze B, Richard-Plouet M, Goullet A, Jouan PY Applied Surface Science, 357, 838, 2015 |
8 |
Effect of the deposition conditions of NiO anode buffer layers in organic solar cells, on the properties of these cells Nguyen DT, Ferrec A, Keraudy J, Bernede JC, Stephant N, Cattin L, Jouan PY Applied Surface Science, 311, 110, 2014 |
9 |
Comparison of the structural properties and residual stress of AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering at different working pressures Aissa KA, Achour A, Camus J, Le Brizoual L, Jouan PY, Djouadi MA Thin Solid Films, 550, 264, 2014 |
10 |
Optical properties of aluminum nitride thin films grown by direct-current magnetron sputtering close to epitaxy Stolz A, Soltani A, Abdallah B, Charrier J, Deresmes D, Jouan PY, Djouadi MA, Dogheche E, De Jaeger JC Thin Solid Films, 534, 442, 2013 |