검색결과 : 1건
No. | Article |
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1 |
Electrodeposition of Cu on Ru barrier layers for damascene processing (vol 153, pg C37, 2005) Moffat TP, Walker M, Chen PJ, Bonevich JE, Egelhoff WF, Richter L, Witt C, Aaltonen T, Ritala M, Leskela M, Josella D Journal of the Electrochemical Society, 153(3), L5, 2006 |