검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Influence of SiH2Cl2 on the kinetics of the chemical vapor deposition of tungsten by SiH4 reduction of WF6 Jongste JF, Oosterlaken TGM, Janssen GCAM, Radelaar S Journal of the Electrochemical Society, 146(1), 167, 1999 |
| 2 |
The Effect of Doping Atoms on the Kinetics of Self-Limiting Tungsten Film Growth on Silicon by Reduction of Tungsten Hexafluoride Vanderjeugd CA, Leusink GJ, Oosterlaken TG, Jongste JF, Janssen GC, Radelaar S Journal of the Electrochemical Society, 142(4), 1326, 1995 |