검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Etch stop in via-hole etching on aluminum interconnection using inductively coupled C2F6 plasma with O-2 additive gas Imai S, Jiwari N Journal of Vacuum Science & Technology B, 27(5), 2252, 2009 |
| 2 |
Helicon Wave Plasma Reactor Employing Single-Loop Antenna Jiwari N, Fukasawa T, Kawakami H, Shindo H, Horiike Y Journal of Vacuum Science & Technology A, 12(4), 1322, 1994 |