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| No. | Article |
|---|---|
| 1 |
Optimization of a Cl-2-H-2 inductively coupled plasma etching process adapted to nonthermalized InP wafers for the realization of deep ridge heterostructures Guilet S, Bouchoule S, Jany C, Corr CS, Chabert P Journal of Vacuum Science & Technology B, 24(5), 2381, 2006 |