화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Effect of bath additives on copper electrodeposited directly on diffusion barrier for integrated silicon devices
Im B, Kim S
Thin Solid Films, 546, 263, 2013
2 An electrochemical and in situ SERS study of Cu electrodeposition from acidic sulphate solutions in the presence of 3-diethylamino-7-(4-dimethylaminophenylazo)-5-phenylphenazinium chloride (Janus Green B)
Bozzini B, Mele C, D'urzo L, Romanello V
Journal of Applied Electrochemistry, 36(9), 973, 2006