| 1 |
Blue electroluminescence from MOS capacitors with Si-implanted SiO2
Matsuda T, Nishihara K, Kawabe M, Iwata H, Iwatsubo S, Ohzone T
Solid-State Electronics, 48(10-11), 1933, 2004 |
| 2 |
Effect of surface roughness on magnetic properties of Fe films deposited by dual ion beam sputtering
Iwatsubo S, Takahashi T, Naoe M
Thin Solid Films, 343-344, 67, 1999 |
| 3 |
An estimation of optimum Ar ion bombardment energy for good Fe films applying thermal spike effect
Iwatsubo S, Takahashi T, Naoe M
Thin Solid Films, 343-344, 71, 1999 |
| 4 |
Adhesive characteristics of Fe films deposited by ion beam sputtering with Ar ion bombardment
Iwatsubo S, Takahashi T, Naoe M
Thin Solid Films, 343-344, 261, 1999 |
| 5 |
Structure and adhesive properties of TiN films reactively deposited by plasma-free sputtering
Takahashi T, Masugata K, Iwatsubo S, Asada M
Thin Solid Films, 343-344, 273, 1999 |
| 6 |
Magnetic and Structural-Properties of Fe Films Deposited by Ion-Beam Sputtering with a High-Energy Assisted Process
Iwatsubo S, Takahashi T, Naoe M
Thin Solid Films, 281-282, 484, 1996 |
