1 |
Diagnostic study of argon and oxygen mixtures in dual-frequency capacitively coupled plasmas using quadrupole mass spectrometer Jiang XZ, Li WL, Wumaier TED, Yao HB Chemical Physics Letters, 730, 472, 2019 |
2 |
On the role of the energetic species in TiN thin film growth by reactive deep oscillation magnetron sputtering in Ar/N-2 Oliveira JC, Fernandes F, Serra R, Cavaleiro A Thin Solid Films, 645, 253, 2018 |
3 |
Evolution of the nitrogen depth distribution in an implanted titanium alloy with a surface carbon nanolayer Vlcak P, Horazdovsky T, Valenta R, Kovac J Chemical Physics Letters, 679, 25, 2017 |
4 |
Analysis of ion energy distribution at the substrate during a HPPMS (Cr,Al)N process using retarding field energy analyzer and energy resolved mass spectrometer Bobzin K, Brogelmann T, Brugnara RH, Chromy S Thin Solid Films, 596, 140, 2015 |
5 |
Ionized sputtering with a pulsed hollow cathode magnetron Fietzke F, Kratzschmar BG Thin Solid Films, 572, 147, 2014 |
6 |
The phase and microstructure of CrAIN films deposited by pulsed dc magnetron sputtering with synchronous and asynchronous bipolar pulses Lin JL, Pinkas M, Sproul WD, Moore JJ Thin Solid Films, 520(1), 166, 2011 |
7 |
Deposition rate of SiN film grown by using a pulsed-PECVD at room-temperature Kim S, Kim B Current Applied Physics, 10(3), S372, 2010 |
8 |
A comparative study of CrNx coatings Synthesized by dc and pulsed dc magnetron sputtering Lin J, Wu ZL, Zhang XH, Mishra B, Moore JJ, Sproul WD Thin Solid Films, 517(6), 1887, 2009 |
9 |
Ion and photon emission from laser-generated titanium-plasma Torrisi L, Margarone D, Borrielli A, Caridi F Applied Surface Science, 254(13), 4007, 2008 |
10 |
Ion Dynamics in Plasma Processing for the Fabrication of Ultrafine Structures Kim CK Korean Journal of Chemical Engineering, 22(5), 762, 2005 |