화학공학소재연구정보센터
검색결과 : 14건
No. Article
1 Diagnostic study of argon and oxygen mixtures in dual-frequency capacitively coupled plasmas using quadrupole mass spectrometer
Jiang XZ, Li WL, Wumaier TED, Yao HB
Chemical Physics Letters, 730, 472, 2019
2 On the role of the energetic species in TiN thin film growth by reactive deep oscillation magnetron sputtering in Ar/N-2
Oliveira JC, Fernandes F, Serra R, Cavaleiro A
Thin Solid Films, 645, 253, 2018
3 Evolution of the nitrogen depth distribution in an implanted titanium alloy with a surface carbon nanolayer
Vlcak P, Horazdovsky T, Valenta R, Kovac J
Chemical Physics Letters, 679, 25, 2017
4 Analysis of ion energy distribution at the substrate during a HPPMS (Cr,Al)N process using retarding field energy analyzer and energy resolved mass spectrometer
Bobzin K, Brogelmann T, Brugnara RH, Chromy S
Thin Solid Films, 596, 140, 2015
5 Ionized sputtering with a pulsed hollow cathode magnetron
Fietzke F, Kratzschmar BG
Thin Solid Films, 572, 147, 2014
6 The phase and microstructure of CrAIN films deposited by pulsed dc magnetron sputtering with synchronous and asynchronous bipolar pulses
Lin JL, Pinkas M, Sproul WD, Moore JJ
Thin Solid Films, 520(1), 166, 2011
7 Deposition rate of SiN film grown by using a pulsed-PECVD at room-temperature
Kim S, Kim B
Current Applied Physics, 10(3), S372, 2010
8 A comparative study of CrNx coatings Synthesized by dc and pulsed dc magnetron sputtering
Lin J, Wu ZL, Zhang XH, Mishra B, Moore JJ, Sproul WD
Thin Solid Films, 517(6), 1887, 2009
9 Ion and photon emission from laser-generated titanium-plasma
Torrisi L, Margarone D, Borrielli A, Caridi F
Applied Surface Science, 254(13), 4007, 2008
10 Ion Dynamics in Plasma Processing for the Fabrication of Ultrafine Structures
Kim CK
Korean Journal of Chemical Engineering, 22(5), 762, 2005