검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Ion flux composition in HBr/Cl-2/O-2 and HBr/Cl-2/O-2/CF4 chemistries during silicon etching in industrial high-density plasmas Cunge G, Inglebert RL, Joubert O, Vallier L, Sadeghi N Journal of Vacuum Science & Technology B, 20(5), 2137, 2002 |
| 2 |
Plasma polymerized methylsilane I: Characterization of thin photosensitive films for advanced lithography applications Monget C, Joubert O, Inglebert RL Journal of Vacuum Science & Technology B, 18(5), 2534, 2000 |