| 1 |
Bi-stage time evolution of nano-morphology on inductively coupled plasma etched fused silica surface caused by surface morphological transformation
Jiang XL, Zhang LJ, Bai Y, Liu Y, Liu ZK, Qiu KQ, Liao W, Zhang CC, Yang K, Chen J, Jiang YL, Yuan XD
Applied Surface Science, 409, 156, 2017 |
| 2 |
Optimum inductively coupled plasma etching of fused silica to remove subsurface damage layer
Jiang XL, Liu Y, Liu ZK, Qiu KQ, Xu XD, Hong YL, Fu SJ
Applied Surface Science, 355, 1180, 2015 |
| 3 |
Inductively coupled plasma etching of GaAs in Cl-2/Ar, Cl-2/Ar/O-2 chemistries with photoresist mask
Liu K, Ren XM, Huang YQ, Cai SW, Duan XF, Wang Q, Kang C, Li JS, Chen QT, Fei JR
Applied Surface Science, 356, 776, 2015 |
| 4 |
Fabrication of nanorod InGaN/GaN multiple self-assembled Ni nano-island masks quantum wells with
Yang GF, Guo Y, Zhu HX, Yan DW, Li GH, Gao SM, Dong KX
Applied Surface Science, 285, 772, 2013 |
| 5 |
Inductively coupled plasma etching to fabricate sensing window for polymer waveguide biosensor application
Wang XB, Meng J, Sun XQ, Yang TF, Sun J, Chen CM, Zheng CT, Zhang DM
Applied Surface Science, 259, 105, 2012 |
| 6 |
Antireflective properties of disordered Si SWSs with hydrophobic surface by thermally dewetted Pt nanomask patterns for Si-based solar cells
Leem JW, Chung KS, Yu JS
Current Applied Physics, 12(1), 291, 2012 |
| 7 |
Dry etching characteristics of TiN thin films in CF4/BCl3/N-2 plasma
Joo YH, Woo JC, Kim CI
Thin Solid Films, 520(6), 2339, 2012 |
| 8 |
Optimized inductively coupled plasma etching for poly(methyl-methacrylate-glycidly-methacrylate) optical waveguide
Sun XQ, Li XD, Chen CM, Zhang K, Meng J, Wang XB, Yang TF, Zhang DM, Wang F, Xie ZY
Thin Solid Films, 520(18), 5946, 2012 |
| 9 |
GaN etch rate and surface roughness evolution in Cl-2/Ar based inductively coupled plasma etching
Rawal DS, Arora H, Agarwal VR, Vinayak S, Kapoor A, Sehgal BK, Muralidharan R, Saha D, Malik HK
Thin Solid Films, 520(24), 7212, 2012 |
| 10 |
Improvement of the performance of GaN-based LEDs grown on sapphire substrates patterned by wet and ICP etching
Gao HY, Yan FW, Zhang Y, Li JM, Zeng YP, Wang GH
Solid-State Electronics, 52(6), 962, 2008 |
