화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Determination of silicon oxide layer thickness by time-of-flight secondary ion mass spectroscopy
Brox O, Iltgen K, Hellweg S, Benninghoven A
Journal of Vacuum Science & Technology B, 17(5), 2191, 1999
2 Ultrashallow secondary ion mass spectroscopy depth profiling of doping spikes and Si/SiGe/Si heterostructures using different primary species
Kruger D, Iltgen K, Heinemann B, Kurps R, Benninghoven A
Journal of Vacuum Science & Technology B, 16(1), 292, 1998
3 Secondary ion mass spectrometry depth profiling of ultralow-energy ion implants : Problems and solutions
van Berkum JGM, Collart EJH, Weemers K, Gravesteijn DJ, Iltgen K, Benninghoven A, Niehuis E
Journal of Vacuum Science & Technology B, 16(1), 298, 1998
4 Optimized Time-of-Flight Secondary-Ion Mass-Spectroscopy Depth Profiling with a Dual-Beam Technique
Iltgen K, Bendel C, Benninghoven A, Niehuis E
Journal of Vacuum Science & Technology A, 15(3), 460, 1997