검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Observation of the Behavior of Additives in Copper Electroplating Using a Microfluidic Device Akita T, Tomie M, Ikuta R, Egoshi H, Hayase M Journal of the Electrochemical Society, 166(1), D3058, 2018 |
| 2 |
Sputter-assisted plasma CVD of wide or narrow optical bandgap amorphous CNx : H films usingi-C4H10/N-2 supermagnetron plasma Kinoshita H, Ikuta R, Yamaguchi T Thin Solid Films, 516(13), 4441, 2008 |
| 3 |
Sputter-assisted plasma CVD of polymer-like amorphous CNx : H films using supermagnetron plasma Kinoshita H, Ikuta R, Sakurai K Thin Solid Films, 515(9), 4121, 2007 |
| 4 |
Formation of wide and narrow optical-band-gap amorphous-CNx : H films using i-C4H10/N-2 supermagnetron plasma Kinoshita H, Ikuta R, Sakurai K Applied Surface Science, 244(1-4), 314, 2005 |
| 5 |
Deposition and field-emission characterization of electrically conductive nitrogen-doped diamond-like amorphous carbon films Kinoshita H, Ikuta R, Murakami S Journal of Vacuum Science & Technology A, 22(4), 1857, 2004 |