화학공학소재연구정보센터
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No. Article
1 Metastable Ti1-xAlxN films with different Al content
Kimura A, Hasegawa H, Yamada K, Suzuki T
Journal of Materials Science Letters, 19(7), 601, 2000
2 Cubic boron nitride thin film synthesis on silica substrates by low-pressure inductively-coupled r.f. plasma chemical vapor deposition
Chattopadhyay KK, Matsumoto S, Zhang YF, Sakaguchi I, Nishitani-Gamo M, Ando T
Thin Solid Films, 354(1-2), 24, 1999
3 Substrate Effects in Cubic Boron-Nitride Film Formation
Mirkarimi PB, Mccarty KF, Cardinale GF, Medlin DL, Ottesen DK, Johnsen HA
Journal of Vacuum Science & Technology A, 14(1), 251, 1996
4 Comparative-Studies of Tin and Ti1-Xalxn by Plasma-Assisted Chemical-Vapor-Deposition Using a TiCl4/AlCl3/N-2/H-2/Ar Gas-Mixture
Kim KH, Lee SH
Thin Solid Films, 283(1-2), 165, 1996
5 High-Temperature Oxidation Behavior of (Ti1-Xcrx)N Coatings
Otani Y, Hofmann S
Thin Solid Films, 287(1-2), 188, 1996
6 T1-Xalxn Coatings by Plasma-Assisted Chemical-Vapor-Deposition Using a TiCl4/AlCl3/N-2/H-2/Ar Gas-Mixture
Kim KH, Lee SH
Journal of Materials Science Letters, 14(21), 1531, 1995
7 Effect of Stoichiometry on the Phases Present in Boron-Nitride Thin-Films
Hackenberger LB, Pilione LJ, Messier R, Lamaze GP
Journal of Vacuum Science & Technology A, 12(4), 1569, 1994