검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Simple Equipment Tolerant Reflectometry for Monitoring of Molecular-Beam Epitaxy and Metalorganic Chemical-Vapor-Deposition Growth Bean JC, Peticolas LJ, Lum R, Mcdonald ML Journal of Vacuum Science & Technology A, 14(3), 946, 1996 |
| 2 |
Cleaning of Silicon Surfaces by Hydrogen Multipolar Microwave Plasma Excited by Distributed Electron-Cyclotron-Resonance Raynaud P, Pomot C Journal of Vacuum Science & Technology B, 12(2), 574, 1994 |
| 3 |
Determination of Molecular-Beam Epitaxial-Growth Parameters by Ellipsometry Droopad R, Kuo CH, Anand S, Choi KY, Maracas GN Journal of Vacuum Science & Technology B, 12(2), 1211, 1994 |