검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
On monitoring of gas leak in the plasma vacuum process with optical emission spectroscopy Pyun SC, Kwon JH, You SJ, Seong DJ, Kim JH, Shin YH, Shin JS Thin Solid Films, 518(22), 6658, 2010 |
| 2 |
A simple analysis on the abnormal behavior of the argon metastable density in an inductively coupled Ar plasma Park M, Chang HY, You SJ, Kim JH, Seong DJ, Shin YH Thin Solid Films, 518(22), 6694, 2010 |
| 3 |
Highly selective dry etching of alternating phase-shift mask (PSM) structures for extreme ultraviolet lithography (EUVL) using inductively coupled plasmas (ICP) Jung HY, Park YR, Lee HJ, Lee NE, Jeong CY, Ahn J Thin Solid Films, 517(14), 3938, 2009 |
| 4 |
Characterization of a high-frequency inductively coupled plasma source Lee DS, Jun HS, Chang HY Thin Solid Films, 506, 469, 2006 |
| 5 |
Effects of N-2 or Ar plasma exposure on GaAs/AlGaAs heterojunction bipolar transistors Hsu CH, Chen CC, Luo B, Ren F, Pearton SJ, Abernathy CR, Lee JW, Mackenzie KD, Sasserath J Solid-State Electronics, 45(2), 275, 2001 |