화학공학소재연구정보센터
검색결과 : 14건
No. Article
1 A biosensor based on transient photoeffects at a silicon electrode
Tantra R, Hutton RS, Williams DE
Journal of Electroanalytical Chemistry, 538, 205, 2002
2 193 nm single layer resist strategies, concepts, and recent results
Nalamasu O, Houlihan FM, Cirelli RA, Timko AG, Watson GP, Hutton RS, Kometani JM, Reichmanis E, Gabor A, Medina A, Slater S
Journal of Vacuum Science & Technology B, 16(6), 3716, 1998
3 Voltammetric Studies of Ferrocene and the Mercury Dithiophosphate System at Mercury-Electrodes over a Temperature-Range Encompassing the Mercury Liquid-Solid State Transition
Bond AM, Colton R, Harvey J, Hutton RS
Journal of Electroanalytical Chemistry, 426(1-2), 145, 1997
4 Resist design concepts for 193 nm lithography : Opportunities for innovation and invention
Reichmanis E, Nalamasu O, Houlihan FM, Wallow TI, Timko AG, Cirelli R, Dabbagh G, Hutton RS, Novembre AE, Smith BW
Journal of Vacuum Science & Technology B, 15(6), 2528, 1997
5 Effects of Electrode Geometry and Poisoning on Image-Contrast in Photoelectrochemical Microscopy
Mohiuddin TF, Hutton RS, Williams DE
Electrochimica Acta, 41(13), 2025, 1996
6 Photoelectrochemical Imaging of the Etching and Passivation of Silicon in Aqueous KOH
Hutton RS, Port SN, Schiffrin DJ, Williams DE
Journal of Electroanalytical Chemistry, 418(1-2), 153, 1996
7 Selective Electroless Nickel Deposition on Patterned Phosphonate and Carboxylate Polymer-Films
Schilling ML, Katz HE, Houlihan FM, Stein SM, Hutton RS, Taylor GN
Journal of the Electrochemical Society, 143(2), 691, 1996
8 Scanning Laser Photoelectrochemical Microscopy of Immobilized Glucose-Oxidase
Hutton RS, Williams DE, Allen RM, Bennetto HP, Meininghaus C
Journal of Electroanalytical Chemistry, 391(1-2), 203, 1995
9 Plasma Development of a Silylated Bilayer Resist - Effects of Etch Chemistry on Critical Dimension Control and Feature Profiles
Hutton RS, Boyce CH, Taylor GN
Journal of Vacuum Science & Technology B, 13(6), 2366, 1995
10 Low-Temperature UV Oxidation of SiGe for Preparation of Ge Nanocrystals in SiO2
Craciun V, Reader AH, Vandenhoudt DE, Best SP, Hutton RS, Andrei A, Boyd IW
Thin Solid Films, 255(1-2), 290, 1995