검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Advanced secondary ion mass spectroscopy quantification in the first few nanometer of B, P, and As ultrashallow implants Merkulov A, Peres P, Choi S, Horreard F, Ehrke HU, Loibl N, Schuhmacher M Journal of Vacuum Science & Technology B, 28(1), C1C48, 2010 |
| 2 |
Shallow As dose measurements of patterned wafers with secondary ion mass spectrometry and low energy electron induced x-ray emission spectroscopy Ehrke HU, Loibl N, Moret MP, Horreard F, Choi J, Hombourger C, Paret V, Benbalagh R, Morel N, Schuhmacher M Journal of Vacuum Science & Technology B, 28(1), C1C54, 2010 |
| 3 |
Oxygen isotopic measurements on the Cameca Nanosims 50 Slodzian G, Hillion F, Stadermann FJ, Horreard F Applied Surface Science, 203, 798, 2003 |