검색결과 : 7건
No. | Article |
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1 |
Spectroscopic study on amorphous tantalum oxynitride thin films prepared by reactive gas-timing RF magnetron sputtering Lertvanithphol T, Rakreungdet W, Chananonnawathorn C, Eiamchai P, Limwichean S, Nuntawong N, Patthanasettakul V, Klamchuen A, Khemasiri N, Nukeaw J, Seawsakul K, Songsiriritthigul C, Chanlek N, Nakajima H, Songsiriritthigul P, Horprathum M Applied Surface Science, 492, 99, 2019 |
2 |
Oblique angle deposition of nanocolumnar TiZrN films via reactive magnetron co-sputtering technique: The influence of the Zr target powers Phae-ngam W, Horprathum M, Chananonnawathorn C, Lertvanithphol T, Samransuksamer B, Songsiriritthigul P, Nakajima H, Chaiyakun S Current Applied Physics, 19(8), 894, 2019 |
3 |
Engineered omnidirectional antireflection ITO nanorod films with super hydrophobic surface via glancing-angle ion-assisted electron-beam evaporation deposition Nuchuay P, Chaikeeree T, Horprathum M, Mungkung N, Kasayapanand N, Oros C, Limwichean S, Nuntawong N, Chananonnawathorn C, Patthanasettakul V, Muthitamongkol P, Samransuksamer B, Denchitcharoen S, Klamchuen A, Thanachayanont C, Eiamchai P Current Applied Physics, 17(2), 222, 2017 |
4 |
High-performance Electrochemical Energy Storage Electrodes Based on Nickel Oxide-coated Nickel Foam Prepared by Sparking Method Chuminjak Y, Daothong S, Kuntarug A, Phokharatkul D, Horprathum M, Wisitsoraat A, Tuantranont A, Jakmunee J, Singjai P Electrochimica Acta, 238, 298, 2017 |
5 |
Affected annealing time treatment on preferred orientation and thermoelectric properties of h-GeSbTe0.5 alloy thin film Vora-ud A, Thaowonkaew S, Rittiruam M, Horprathum M, Seetawan T Current Applied Physics, 16(3), 305, 2016 |
6 |
Characterization of inhomogeneity in TiO2 thin films prepared by pulsed dc reactive magnetron sputtering Horprathum M, Eiamchai P, Chindaudom P, Nuntawong N, Patthanasettakul V, Limnonthakul P, Limsuwan P Thin Solid Films, 520(1), 272, 2011 |
7 |
Silver nanoparticles deposited on anodic aluminum oxide template using magnetron sputtering for surface-enhanced Raman scattering substrate Wong-ek K, Eiamchai P, Horprathum M, Patthanasettakul V, Limnonthakul P, Chindaudom P, Nuntawong N Thin Solid Films, 518(23), 7128, 2010 |