화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Wet-chemical etching of metals for advanced semiconductor technology nodes: Ru etching in acidic Ce4+ solutions
Philipsen H, Mouwen N, Teck S, Monnens W, Le QT, Holsteyns F, Struyf H
Electrochimica Acta, 306, 285, 2019
2 Superhydrophobic Breakdown of Nanostructured Surfaces Characterized in Situ Using ATR-FTIR
Vrancken N, Sergeant S, Vereecke G, Doumen G, Holsteyns F, Terryn H, De Gendt S, Xu XM
Langmuir, 33(15), 3601, 2017
3 A new technique to fabricate ultra-shallow-junctions, combining in situ vapour HCl etching and in situ doped epitaxial SiGe re-growth
Loo R, Caymax M, Meunier-Beillard P, Peytier I, Holsteyns F, Kubicek S, Verheyen P, Lindsay R, Richard O
Applied Surface Science, 224(1-4), 63, 2004