검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Prediction of placement error of extreme ultraviolet lithography mask by simulation model with equivalent layout pattern Chiba A, Hoshino B, Takahashi M, Yamanashi H, Hoko H, Lee BT, Yoneda T, Ito M, Ogawa T, Okazaki S Journal of Vacuum Science & Technology B, 19(6), 2621, 2001 |