화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Concentrations of active species in the flowing afterglow of a nitrogen microwave plasma
Diamy AM, Hochard L, Legrand JC, Ricard A
Plasma Chemistry and Plasma Processing, 18(4), 447, 1998
2 Determination of C-Atom Density Downstream an Ar-CH4 RF Plasma Torch
Cavadias S, Amouroux J, Hochard L, Ricard A
Plasma Chemistry and Plasma Processing, 15(2), 221, 1995
3 CN Chemiluminescence in N2+ch4 Flowing Afterglow at Low-Temperatures
Janca J, Talsky A, Krcma F, Hochard L, Ricard A
Plasma Chemistry and Plasma Processing, 14(3), 197, 1994