화학공학소재연구정보센터
검색결과 : 14건
No. Article
1 Platinum-Phosphorus Nanoparticles on Carbon Supports for Oxygen-Reduction Catalysts
Suzuki S, Ohbu Y, Mizukami T, Takamori Y, Morishima M, Daimon H, Hiratani M
Journal of the Electrochemical Society, 156(1), B27, 2009
2 Combining Ta2O5 and Nb2O5 in bilayered structures and solid solutions for use in MIM capacitors
Matsui Y, Hiratani M, Kimura S, Asano I
Journal of the Electrochemical Society, 152(5), F54, 2005
3 Ultra-thin titanium oxide film with a rutile-type structure
Hiratani M, Kadoshima M, Hirano T, Shimamoto Y, Matsui Y, Nabatame T, Torii K, Kimura S
Applied Surface Science, 207(1-4), 13, 2003
4 Built-in interface in high-kappa gate stacks
Hiratani M, Torii K, Shimamoto Y, Saito SI
Applied Surface Science, 216(1-4), 208, 2003
5 Rutile-type TiO2 thin film for high-k gate insulator
Kadoshima M, Hiratani M, Shimamoto Y, Torii K, Miki H, Kimura S, Nabatame T
Thin Solid Films, 424(2), 224, 2003
6 An oxidation barrier layer for metal-insulator-metal capacitors: ruthenium silicide
Matsui Y, Nakamura Y, Shimamoto Y, Hiratani M
Thin Solid Films, 437(1-2), 51, 2003
7 Characteristics of ruthenium films prepared by chemical vapor deposition using bis(ethylcyclopentadienyl) ruthenium precursor
Matsui Y, Hiratani M, Nabatame T, Shimamoto Y, Kimura S
Electrochemical and Solid State Letters, 5(1), C18, 2002
8 Conformal platinum thin films prepared by chemical vapor deposition under high oxygen partial pressure
Hiratani M, Nabatame T, Matsui Y, Kimura S
Electrochemical and Solid State Letters, 5(2), C28, 2002
9 Formation and oxidation properties of (Ti1-xAlx)N thin films prepared by dc reactive sputtering
Matsui Y, Hiratani M, Nakamura Y, Asano I, Yano F
Journal of Vacuum Science & Technology A, 20(3), 605, 2002
10 Crystallographic and electrical properties of platinum film grown by chemical vapor deposition using (methylcyclopentadienyl)trimethylplatinum
Hiratani M, Nabatame T, Matsui Y, Kimura S
Thin Solid Films, 410(1-2), 200, 2002