검색결과 : 10건
| No. | Article |
|---|---|
| 1 |
Copper blocking ability of nitrogen-incorporated silicon oxide film Takeda K, Ryuzaki D, Mine T, Hinode K, Yoneyama R Journal of Vacuum Science & Technology B, 21(4), 1323, 2003 |
| 2 |
Abnormal room-temperature oxidation of silicon in the presence of copper Hinode K, Takeda K, Kondo S Journal of Vacuum Science & Technology A, 20(5), 1653, 2002 |
| 3 |
Oxygen plasma resistance of low-k organosilica glass films Furusawa T, Ryuzaki D, Yoneyama R, Homma Y, Hinode K Electrochemical and Solid State Letters, 4(3), G31, 2001 |
| 4 |
Direct resist removal process from copper-exposed vias for low-parasitic-capacitance interconnects Furusawa T, Sakuma N, Ryuzaki D, Kondo S, Takeda K, Machida S, Yoneyama R, Hinode K Journal of the Electrochemical Society, 148(4), G190, 2001 |
| 5 |
Heat and moisture resistance of siloxane-based low-dielectric-constant materials Furusawa T, Ryuzaki D, Yoneyama R, Homma Y, Hinode K Journal of the Electrochemical Society, 148(9), F175, 2001 |
| 6 |
Control of photocorrosion in the copper damascene process Homma Y, Kondo S, Sakuma N, Hinode K, Noguchi J, Ohashi N, Yamaguchi H, Owada N Journal of the Electrochemical Society, 147(3), 1193, 2000 |
| 7 |
Morphology-Dependent Oxidation Behavior of Reactively Sputtered Titanium-Nitride Films Hinode K, Homma Y, Horiuchi M, Takahashi T Journal of Vacuum Science & Technology A, 15(4), 2017, 1997 |
| 8 |
Copper Dry-Etching with Precise Wafer-Temperature Control Using Cl-2 Gas as a Single Reactant Miyazaki H, Takeda K, Sakuma N, Kondo S, Homma Y, Hinode K Journal of Vacuum Science & Technology B, 15(2), 237, 1997 |
| 9 |
Whiskers Grown on Aluminum Thin-Films During Heat-Treatments Hinode K, Homma Y, Sasaki Y Journal of Vacuum Science & Technology A, 14(4), 2570, 1996 |
| 10 |
Number of Voids Formed on a Line - Parameter for Electromigration Lifetime Hinode K, Kondo S, Deguchi O Journal of Vacuum Science & Technology B, 14(2), 687, 1996 |