검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Programmed rate chemical vapor deposition protocols Yang D, Kristof JJ, Jonnalagadda R, Rogers BR, Hillman JT, Foster RF, Cale TS Journal of the Electrochemical Society, 147(2), 723, 2000 |
| 2 |
Texture and surface roughness of PRCVD aluminum films Yang D, Jonnalagadda R, Rogers BR, Hillman JT, Foster RF, Cale TS Thin Solid Films, 332(1-2), 312, 1998 |
| 3 |
Electrical properties of Ti/TiN films prepared by chemical vapor deposition and their applications in submicron structures as contact and barrier materials Hu J, Ameen M, Leusink G, Webb D, Hillman JT Thin Solid Films, 308-309, 589, 1997 |
| 4 |
Some effects of temperature ramping on metal organic chemical vapor deposited Al film nucleation Yang D, Jonnalagadda R, Mahadev V, Cale TS, Hillman JT, Foster RF, Rogers BR Thin Solid Films, 308-309, 615, 1997 |