검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Comparison of Advanced Plasma Sources for Etching Applications .4. Plasma-Induced Damage in a Helicon and a Multipole Electron-Cyclotron-Resonance Source Blayo N, Tepermeister I, Benton JL, Higashi GS, Boone T, Onuoha A, Klemens FP, Ibbotson DE, Sawin HH Journal of Vacuum Science & Technology B, 12(3), 1340, 1994 |