화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Properties of aluminum oxide thin films deposited by pulsed laser deposition and plasma enhanced chemical vapor deposition
Cibert C, Hidalgo H, Champeaux C, Tristant P, Tixier C, Desmaison J, Catherinot A
Thin Solid Films, 516(6), 1290, 2008
2 Physico-chemistry and morphology of silicon surface during the first stage of alumina deposition
Jonnard P, Desmaison J, Hidalgo H, Rossignol F, Tixier C, Tristant P
Applied Surface Science, 212, 674, 2003
3 Microwave plasma enhanced CVD of aluminum oxide films: OES diagnostics and influence of the RF bias
Tristant P, Ding Z, Vinh QBT, Hidalgo H, Jauberteau JL, Desmaison J, Dong C
Thin Solid Films, 390(1-2), 51, 2001