화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Characterization of WF6/N-2/H-2 plasma enhanced chemical vapor deposited WxN films as barriers for Cu metallization
Li H, Jin S, Bender H, Lanckmans F, Heyvaert I, Maex K, Froyen L
Journal of Vacuum Science & Technology B, 18(1), 242, 2000
2 Comparative-Study of the Interface Roughness of Ag/Au and Cu/Au Multilayers with Scanning-Tunneling-Microscopy and X-Ray-Diffraction
Heyvaert I, Temst K, Vanhaesendonck C, Bruynseraede Y
Journal of Vacuum Science & Technology B, 14(2), 1121, 1996