화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Gate Quality Si3N4 Prepared by Low-Temperature Remote Plasma-Enhanced Chemical-Vapor-Deposition for III-V Semiconductor-Based Metal-Insulator-Semiconductor Devices
Park DG, Tao M, Li D, Botchkarev AE, Fan Z, Wang Z, Mohammad SN, Rockett A, Abelson JR, Morkoc H, Heyd AR, Alterovitz SA
Journal of Vacuum Science & Technology B, 14(4), 2674, 1996
2 Applications of Variable-Angle Spectroscopic Ellipsometry to Strained SiGe Alloy Heterostructures
Heyd AR, Alterovitz SA, Croke ET, Wang KL, Lee CH
Thin Solid Films, 270(1-2), 91, 1995