| 1 |
Cancer upregulated gene 2 (CUG2), a novel oncogene, promotes sternness-like properties via the NPM1-TGF-beta signaling axis
Kaowinn S, Seo EJ, Heo W, Bae JH, Park EJ, Lee S, Kim YJ, Koh SS, Jang I, Shin DH, Chung YH
Biochemical and Biophysical Research Communications, 514(4), 1278, 2019 |
| 2 |
Electronic and Structural Dynamics of Dicyanoaurate Trimer in Excited State
Sohn SH, Heo W, Lee C, Kim J, Joo T
Journal of Physical Chemistry A, 123(32), 6904, 2019 |
| 3 |
Low binding affinity and reduced complement-dependent cell death efficacy of ofatumumab produced using a plant system (Nicotiana benthamiana L.)
Jin N, Lee JW, Heo W, Ryu MY, So MK, Ko BJ, Kim HY, Yoon SM, Lee J, Kim JY, Kim WT
Protein Expression and Purification, 159, 34, 2019 |
| 4 |
Excited State Intramolecular Proton Transfer Dynamics of 1-Hydroxy-2-acetonaphthone
Kim J, Heo W, Joo T
Journal of Physical Chemistry B, 119(6), 2620, 2015 |
| 5 |
Crystal structure of Rab6A'(Q72L) mutant reveals unexpected GDP/Mg2+ binding with opened GTP-binding domain
Shin YC, Yoon JH, Jang TH, Kim SY, Do Heo W, So I, Jeon JH, Park HH
Biochemical and Biophysical Research Communications, 424(2), 269, 2012 |
| 6 |
Surface morphological evolution of crystalline Si during chemical dry etching using F radicals and NO gas
Ahn JH, Heo W, Jung CR, Lee NE
Current Applied Physics, 11(5), S73, 2011 |
| 7 |
Improvement of Mechanical and Electrical Stability of Flexible Organic Field-Effect Transistors by Multistack Hybrid Encapsulation
Seol YG, Heo W, Park JS, Lee NE, Lee DK, Kim YJ
Journal of the Electrochemical Society, 158(9), H931, 2011 |
| 8 |
Comparison of line edge roughness and profile angles of chemical vapor deposited amorphous carbon etched in O-2/N-2/Ar and H-2/N-2/Ar inductively coupled plasmas
Park YR, Kwon BS, Jung CY, Heo W, Lee NE, Shon JW
Thin Solid Films, 519(20), 6755, 2011 |
| 9 |
Fast release process of metal structure using chemical dry etching of sacrificial Si layer
Ahn JH, Heo W, Lee NE, Cho HJ
Thin Solid Films, 519(20), 6769, 2011 |
| 10 |
Highly selective etching of silicon nitride to physical-vapor-deposited a-C mask in dual-frequency capacitively coupled CH2F2/H-2 plasmas
Kim JS, Kwon BS, Heo W, Jung CR, Park JS, Shon JW, Lee NE
Journal of Vacuum Science & Technology A, 28(1), 65, 2010 |
