검색결과 : 35건
| No. | Article |
|---|---|
| 1 |
Photochemical Doping and Tuning of the Work Function and Dirac Point in Graphene Using Photoacid and Photobase Generators Baltazar J, Sojoudi H, Paniagua SA, Zhang SY, Lawson RA, Marder SR, Graham S, Tolbert LM, Henderson CL Advanced Functional Materials, 24(32), 5147, 2014 |
| 2 |
Simulation of Models for Multifunctional Photopolymerization Kinetics Altun-Ciftcioglu GA, Ersoy-Mericboyu A, Henderson CL Polymer Engineering and Science, 54(8), 1737, 2014 |
| 3 |
Gel time prediction of multifunctional acrylates using a kinetics model Boddapati A, Rahane SB, Slopek RP, Breedveld V, Henderson CL, Grover MA Polymer, 52(3), 866, 2011 |
| 4 |
Stochastic Modeling and Simulation of Photopolymerization Process Altun-Ciftcioglu GA, Ersoy-Mericboyu A, Henderson CL Polymer Engineering and Science, 51(9), 1710, 2011 |
| 5 |
High sensitivity nonchemically amplified molecular resists based on photosensitive dissolution inhibitors Lawson RA, Tolbert LM, Henderson CL Journal of Vacuum Science & Technology B, 28(6), C6S12, 2010 |
| 6 |
Understanding the relationship between true and measured resist feature critical dimension and line edge roughness using a detailed scanning electron microscopy simulator Lawson RA, Henderson CL Journal of Vacuum Science & Technology B, 28(6), C6H34, 2010 |
| 7 |
Comparison of positive tone versus negative tone resist pattern collapse bahavior* Yeh WM, Noga DE, Lawson RA, Tolbert LM, Henderson CL Journal of Vacuum Science & Technology B, 28(6), C6S6, 2010 |
| 8 |
Negative tone molecular resists using cationic polymerization: Comparison of epoxide and oxetane functional groups Lawson RA, Noga DE, Younkin TR, Tolbert LM, Henderson CL Journal of Vacuum Science & Technology B, 27(6), 2998, 2009 |
| 9 |
Bond contribution model for the prediction of glass transition temperature in polyphenol molecular glass resists Lawson RA, Yeh WM, Henderson CL Journal of Vacuum Science & Technology B, 27(6), 3004, 2009 |
| 10 |
Understanding the effects of photoacid distribution homogeneity and diffusivity on critical dimension control and line edge roughness in chemically amplified resists Lee CT, Lawson RA, Henderson CL Journal of Vacuum Science & Technology B, 26(6), 2276, 2008 |