검색결과 : 9건
| No. | Article |
|---|---|
| 1 |
Spatially resolved CF, CF2, SiF and SiF2 densities in fluorocarbon containing inductively driven discharges Hebner GA Applied Surface Science, 192(1-4), 161, 2002 |
| 2 |
Ion and neutral species in C2F6 and CHF3 dielectric etch discharges Jayaraman R, McGrath RT, Hebner GA Journal of Vacuum Science & Technology A, 17(4), 1545, 1999 |
| 3 |
Surface dependent electron and negative ion density in inductively coupled discharges Hebner GA, Blain MG, Hamilton TW, Nichols CA, Jarecki RL Journal of Vacuum Science & Technology A, 17(6), 3172, 1999 |
| 4 |
Influence of surface material on the boron chloride density in inductively coupled discharges Hebner GA, Blain MG, Hamilton TW Journal of Vacuum Science & Technology A, 17(6), 3218, 1999 |
| 5 |
Optical self-absorption technique for qualitative measurement of excited-state densities in plasma reactors Miller PA, Hebner GA, Jarecki RL, Ni T Journal of Vacuum Science & Technology A, 16(6), 3240, 1998 |
| 6 |
Direct Simulation Monte-Carlo of Inductively-Coupled Plasma and Comparison with Experiments Johannes J, Bartel T, Hebner GA, Woodworth J, Economou DJ Journal of the Electrochemical Society, 144(7), 2448, 1997 |
| 7 |
Negative-Ion Densities in Chlorine-Containing and Boron-Trichloride-Containing Inductively-Coupled Plasmas Fleddermann CB, Hebner GA Journal of Vacuum Science & Technology A, 15(4), 1955, 1997 |
| 8 |
Metastable Chlorine Ion Kinetics in Inductively-Coupled Plasmas Hebner GA, Fleddermann CB, Miller PA Journal of Vacuum Science & Technology A, 15(5), 2698, 1997 |
| 9 |
Negative-Ion Density in Inductively-Coupled Chlorine Plasmas Hebner GA Journal of Vacuum Science & Technology A, 14(4), 2158, 1996 |