검색결과 : 9건
| No. | Article |
|---|---|
| 1 |
Impact of Surface Chemistry on Copper Deposition in Mesoporous Silicon Darwich W, Garron A, Bockowski P, Santini C, Gaillard F, Haumesser PH Langmuir, 32(30), 7452, 2016 |
| 2 |
Electrochemical atomic layer deposition of copper nanofilms on ruthenium Gebregziabiher DK, Kim YG, Thambidurai C, Ivanova V, Haumesser PH, Stickney JL Journal of Crystal Growth, 312(8), 1271, 2010 |
| 3 |
E-ALD of Cu Nanofilms on Ru/Ta Wafers Using Surface Limited Redox Replacement Thambidurai C, Gebregziabiher DK, Liang XH, Zhang QH, Ivanova V, Haumesser PH, Stickney JL Journal of the Electrochemical Society, 157(8), D466, 2010 |
| 4 |
Alkoxysilane Layers Compatible with Copper Deposition for Advanced Semiconductor Device Applications Rebiscoul D, Perrut V, Morel T, Jayet C, Cubitt R, Haumesser PH Langmuir, 26(11), 8981, 2010 |
| 5 |
Inhomogeneous nucleation and growth of palladium and alloyed cobalt during self-aligned capping of advanced copper interconnects Olivier S, Decorps T, Calvo-Munoz M, Da Silva S, Cayron C, Haumesser PH, Passemad G Thin Solid Films, 518(17), 4773, 2010 |
| 6 |
Alkoxysilane layers deposited by SC CO2 process on silicon oxide for microelectronics applications Rebiscoul D, Perrut V, Renault O, Rieutord F, Olivier S, Haumesser PH Journal of Supercritical Fluids, 51(2), 287, 2009 |
| 7 |
Pore sealing of a porous dielectric by using a thin PECVD a-SiC : H conformal liner Jousseaume V, Fayolle M, Guedj C, Haumesser PH, Huguet C, Pierre F, Pantel R, Feldis H, Passemard G Journal of the Electrochemical Society, 152(10), F156, 2005 |
| 8 |
Czochralski growth of six Yb-doped double borate and silicate laser materials Haumesser PH, Gaume R, Benitez JM, Viana B, Ferrand B, Aka G, Vivien D Journal of Crystal Growth, 233(1-2), 233, 2001 |
| 9 |
The structure of Ni(OH)(2): From the ideal material to the electrochemically active one Tessier C, Haumesser PH, Bernard P, Delmas C Journal of the Electrochemical Society, 146(6), 2059, 1999 |