검색결과 : 7건
| No. | Article |
|---|---|
| 1 |
Aqueous base development and acid diffusion length optimization in negative epoxy resist for electron beam lithography Glezos N, Argitis P, Velessiotis D, Raptis I, Hatzakis M, Hudek P, Kostic I Journal of Vacuum Science & Technology B, 18(6), 3431, 2000 |
| 2 |
Synthesis of Some Onium Salts and Their Comparison as Cationic Photoinitiators in an Epoxy Resist Everett JP, Schmidt DL, Rose GD, Argritis P, Aidinis CJ, Hatzakis M Polymer, 38(7), 1719, 1997 |
| 3 |
Wet Silylation and Oxygen Plasma Development of Photoresists - A Mature and Versatile Lithographic Process for Microelectronics and Microfabrication Gogolides E, Tzevelekis D, Grigoropoulos S, Tegou E, Hatzakis M Journal of Vacuum Science & Technology B, 14(5), 3332, 1996 |
| 4 |
Surfactant-Modified Epoxy-Resins as Novel Negative-Acting Deep UV Photoresists Everett J, Piechocki C, Argitis P, Hatzakis M Journal of Applied Polymer Science, 58(1), 179, 1995 |
| 5 |
Advanced Epoxy Novolac Resist for Fast High-Resolution Electron-Beam Lithography Argitis P, Raptis I, Aidinis CJ, Glezos N, Baciocchi M, Everett J, Hatzakis M Journal of Vacuum Science & Technology B, 13(6), 3030, 1995 |
| 6 |
Quarter-Micron Lithography with a Wet-Silylated and Dry-Developed Commercial Photoresist Gogolides E, Tzevelekis D, Tsoi E, Hatzakis M, Goethals AM, Baik KH, Vanroey F Journal of Vacuum Science & Technology B, 12(6), 3914, 1994 |
| 7 |
Analytical Evaluation of the Energy Deposition Function in Electron-Beam Lithography in the Case of a Composite Substrate Raptis I, Glezos N, Hatzakis M Journal of Vacuum Science & Technology B, 11(6), 2754, 1993 |