화학공학소재연구정보센터
검색결과 : 27건
No. Article
1 Grid-pattern formation of extracellular matrix on silicon by low-temperature atmospheric-pressure plasma jets for neural network biochip fabrication
Ando A, Uno H, Urisu T, Hamaguchi S
Applied Surface Science, 276, 1, 2013
2 Dependence of catalytic properties of indium-implanted SiO2 thin films on the energy and dose of incident indium ions
Yoshimura S, Kiuchi M, Nishimoto Y, Yasuda M, Baba A, Hamaguchi S
Thin Solid Films, 520(15), 4894, 2012
3 Novel catalysts: Indium implanted SiO2 thin films
Yoshimura S, Hine K, Kiuchi M, Nishimoto Y, Yasuda M, Baba A, Hamaguchi S
Applied Surface Science, 257(1), 192, 2010
4 CoSix contact resistance after etching and ashing plasma exposure
Katahira K, Fukasawa M, Kobayashi S, Takizawa T, Isobe M, Hamaguchi S, Nagahata K, Tatsumi T
Journal of Vacuum Science & Technology A, 27(4), 844, 2009
5 Molecular dynamics simulation of microcrystalline Si deposition processes by silane plasmas
Matsukuma M, Hamaguchi S
Thin Solid Films, 516(11), 3443, 2008
6 Molecular dynamics simulations for nitridation of organic polymer surfaces due to hydrogen-nitrogen ion beam injections
Yamashiro M, Yamada H, Hamaguchi S
Thin Solid Films, 516(11), 3449, 2008
7 Magnetized microdischarge plasma generation at low pressure
Ito T, Kobayashi K, Hamaguchi S, Cappelli MA
Thin Solid Films, 516(19), 6668, 2008
8 Experimental evaluation of MgO sputtering yields by monochromatic Ne, Kr, or Xe ion beams
Hine K, Yoshimura S, Ikuse K, Kiuchi M, Hashimoto J, Terauchi M, Nishitani M, Hamaguchi S
Thin Solid Films, 517(2), 835, 2008
9 Control of atomic layer degradation on Si substrate
Nakamura Y, Tatsumi T, Kobayashi S, Kugimiya K, Harano T, Ando A, Kawase T, Hamaguchi S, Iseda S
Journal of Vacuum Science & Technology A, 25(4), 1062, 2007
10 MD simulations of amorphous SiO2 thin film formation in reactive sputtering deposition processes
Taguchi M, Hamaguchi S
Thin Solid Films, 515(12), 4879, 2007