검색결과 : 8건
No. | Article |
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1 |
Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure Karwal S, Verheijen MA, Arts K, Faraz T, Kessels WMM, Creatore M Plasma Chemistry and Plasma Processing, 40(3), 697, 2020 |
2 |
Structure and mechanical properties of hafnium nitride films deposited by direct current, mid-frequency, and high-power impulse magnetron sputtering Tillmann W, Dias NFL, Stangier D, Tolan M, Paulus M Thin Solid Films, 669, 65, 2019 |
3 |
Hafnium nitride for hot carrier solar cells Chung SM, Shrestha S, Wen XM, Feng Y, Gupta N, Xia HZ, Yu P, Tang J, Conibeer G Solar Energy Materials and Solar Cells, 144, 781, 2016 |
4 |
Influence of Hf on the structure, thermal stability and oxidation resistance of Ti-Al-N coatings Xu YX, Chen L, Pei F, Du Y, Liu Y, Yue JL Thin Solid Films, 565, 25, 2014 |
5 |
Hydrogen permeation through a Pd/Ta composite membrane with a HfN intermediate layer Nozaki T, Hatano Y International Journal of Hydrogen Energy, 38(27), 11983, 2013 |
6 |
Epitaxial growth of GaN on single-crystal Mo substrates using HfN buffer layers Okamoto K, Inoue S, Nakano T, Ohta J, Fujioka H Journal of Crystal Growth, 311(5), 1311, 2009 |
7 |
Influence of N-2 flow ratio on the properties of hafnium nitride thin films prepared by DC magnetron sputtering Yuan LY, Fang GJ, Li C, Wang MJ, Liu NS, Lei A, Cheng YZ, Gao HM, Zhao XZ Applied Surface Science, 253(20), 8538, 2007 |
8 |
Effect of NH3 on the fabrication of HfN as gate-electrode using MOCVD Wang WW, Nabatame T, Shimogaki Y Thin Solid Films, 498(1-2), 75, 2006 |