화학공학소재연구정보센터
검색결과 : 12건
No. Article
1 In-situ photoluminescence measurements during MOVPE growth of GaN and InGaN MQW structures
Prall C, Kaspari C, Brunner F, Haberland K, Weyers M, Rueter D
Journal of Crystal Growth, 415, 1, 2015
2 Anisotropic bow and plastic deformation of GaN on silicon
Dadgar A, Fritze S, Schulz O, Hennig J, Blasing J, Witte H, Diez A, Heinle U, Kunze M, Daumiller I, Haberland K, Krost A
Journal of Crystal Growth, 370, 278, 2013
3 In-Situ Monitoring the Growth of Polypyrrole Films at Liquid/Solid Interface Using a Combination of Polarized Infrared Spectroscopy and Reflectance Anisotropy Spectroscopy
Sun GG, Zhang X, Kaspari C, Haberland K, Rappich J, Hinrichs K
Journal of the Electrochemical Society, 159(10), H811, 2012
4 Uniformity of the wafer surface temperature during MOVPE growth of GaN-based laser diode structures on GaN and sapphire substrate
Hoffmann V, Knauer A, Brunner C, Einfeldt S, Weyers M, Trankle G, Haberland K, Zettler JT, Kneissl M
Journal of Crystal Growth, 315(1), 5, 2011
5 Heteroepitaxy of GaN on silicon: In situ measurements
Krost A, Dadgar A, Schulze F, Clos R, Haberland K, Zettler T
Materials Science Forum, 483, 1051, 2005
6 On the AlAs/GaAs (001) interface dielectric anisotropy
Hunderi O, Zettler JT, Haberland K
Thin Solid Films, 472(1-2), 261, 2005
7 In situ measurements of strains and stresses in GaN heteroepitaxy and its impact on growth temperature
Dadgar A, Schulze F, Zettler T, Haberland K, Clos R, Strassburger G, Blasing J, Diez A, Krost A
Journal of Crystal Growth, 272(1-4), 72, 2004
8 Use of SiC band gap temperature dependence for absolute calibration of emissivity corrected pyrometers in III-nitride MOVPE
Steins R, Kaluza N, Hardtdegen H, Zorn M, Haberland K, Zettler JT
Journal of Crystal Growth, 272(1-4), 81, 2004
9 In-situ determination of interface roughness in MOVPE-grown visible VCSELs by reflectance spectroscopy
Haberland K, Zorn M, Klein A, Bhattacharya A, Weyers M, Zettler JT, Richter W
Journal of Crystal Growth, 248, 194, 2003
10 MOVPE process development for 650 nm VCSELS using optical in-situ techniques
Zorn M, Haberland K, Knigge A, Bhattacharya A, Weyers M, Zettler JT, Richter W
Journal of Crystal Growth, 235(1-4), 25, 2002