화학공학소재연구정보센터
검색결과 : 36건
No. Article
1 A Pt/AlGaN/GaN heterostructure field-effect transistor (HFET) prepared by an electrophoretic deposition (EPD)-gate approach
Hung CW, Chang CH, Chen WC, Chen CC, Chen HI, Tsai YT, Tsai JH, Liu WC
Solid-State Electronics, 124, 5, 2016
2 Characteristics enhancement of a GaAs based heterostructure field-effect transistor with an electrophoretic deposition (EPD) surface treated gate structure
Chen CC, Chen HI, Liu IP, Chou PC, Liou JK, Tsai YT, Liu WC
Applied Surface Science, 341, 120, 2015
3 Reduction of leakage current by O-2 plasma treatment for device isolation of AlGaN/GaN heterojunction field-effect transistors
Jiang Y, Wang QP, Zhang FZ, Li L, Zhou DQ, Liu Y, Wang DJ, Ao JP
Applied Surface Science, 351, 1155, 2015
4 Alternative isolation-feature geometries and polarization-engineering of polar AlGaN/GaN HFETs
Loghmany A, Valizadeh P
Solid-State Electronics, 103, 162, 2015
5 Simulation study of GaN-based HFETs with graded AlGaN barrier
Zhou XY, Feng ZH, Fang YL, Wang YG, Lv YJ, Dun SB, Gu GD, Tan X, Song XB, Yin JY, Cai SJ
Solid-State Electronics, 109, 90, 2015
6 On a transistor-type hydrogen gas sensor prepared by an electrophoretic deposition (EPD) approach
Chen CC, Chen HI, Liu IP, Chou PC, Liou JK, Chiou YJ, Liu HY, Liu WC
International Journal of Hydrogen Energy, 39(25), 13320, 2014
7 Growth and analysis of modulation-doped AlGaN/GaN heterostructure on semi-insulating SiC substrate
Kim DS, Won CH, Kim RH, Lim BO, Choi GW, Lee BH, Kim HJ, Hong IP, Lee JH
Journal of Crystal Growth, 395, 5, 2014
8 Improving off-state leakage characteristics for high voltage AlGaN/GaN-HFETs on Si substrates
Moon SW, Twynam J, Lee J, Seo D, Jung S, Choi HG, Shim H, Yim JS, Roh SD
Solid-State Electronics, 96, 19, 2014
9 Performance of AlGaN/GaN MISHFET using dual-purpose thin Al2O3 layer for surface protection and gate insulator
Kim DK, Sindhuri V, Jo YW, Kim DS, Kang HS, Lee JH, Lee YS, Bae Y, Hahm SH, Lee JH
Solid-State Electronics, 100, 11, 2014
10 Physics based modeling of gate leakage current due to traps in AlGaN/GaN HFETs
Goswami A, Trew RJ, Bilbro GL
Solid-State Electronics, 80, 23, 2013