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Characterization and optimization of MIS-HEMTs device of high similar to k dielectric material on quaternary barrier of Al0.42In0.03Ga0.55N/UID-AIN/GaN/GaN heterostructure for high power switching application Tarauni YU, Thiruvadigal DJ, Joseph HB Applied Surface Science, 488, 427, 2019 |
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Al2O3 formed by post plasma oxidation of Al as a Gate dielectric for AlGaN/GaN MIS-HEMTs Takhar K, Upadhyay BB, Yadav YK, Ganguly S, Saha D Applied Surface Science, 481, 219, 2019 |
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Electronic band alignment in AlGaN/GaN high electron-mobility transistors investigated using scanning photocurrent microscopy Kim YC, Son BH, Jeong HY, Park KH, Ahn YH Current Applied Physics, 19(4), 406, 2019 |
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High temperature ammonia MBE-Real way to improve crystal quality of nitride heterostructures Petrov SI, Alexeev AN, Mamaev VV, Novikov SA, Lutsenko EV, Rzheutski MV Journal of Crystal Growth, 514, 40, 2019 |
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High-periphery GaN HEMT modeling up to 65 GHz and 200 degrees C Crupi G, Raffo A, Vadala V, Vannini G, Caddemi A Solid-State Electronics, 152, 11, 2019 |
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Growth of AlGaN/GaN heterostructure with lattice-matched AlIn(Ga)N back barrier Kim JG, Kang SH, Janicki L, Lee JH, Ju JM, Kim KW, Lee YS, Lee SH, Lim JW, Kwon HS, Lee JH Solid-State Electronics, 152, 24, 2019 |
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A compact model and TCAD simulation for GaN-gate injection transistor (GIT) Garcia F, Shamsir S, Islam SK Solid-State Electronics, 151, 52, 2019 |
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Ohmic contact to AlGaN/GaN HEMT with electrodes in contact with heterostructure interface Chen DB, Wan LJ, Li J, Liu ZK, Li GQ Solid-State Electronics, 151, 60, 2019 |
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Normally-off AlGaN/GaN MIS-HEMT with low gate leakage current using a hydrofluoric acid pre-treatment Kurt G, Gulseren ME, Ghobadi TGU, Ural S, Kayal OA, Ozturk M, Butun B, Kabak M, Ozbay E Solid-State Electronics, 158, 22, 2019 |
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Evaluation of an InAs HEMT with source-connected field plate for high-speed and low-power logic applications Yao JN, Lin YC, Lin MS, Huang TJ, Hsu HT, Sze SM, Chang EY Solid-State Electronics, 157, 55, 2019 |