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| No. | Article |
|---|---|
| 1 |
Improved interface properties of atomic-layer-deposited HfO2 film on InP using interface sulfur passivation with H2S pre-deposition annealing Jin HS, Cho YJ, Seok TJ, Kim DH, Kim DW, Lee SM, Park JB, Yun DJ, Kim SK, Hwang CS, Park TJ Applied Surface Science, 357, 2306, 2015 |