검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Influence of Plasma-Enhanced Chemical Vapor Deposition Parameters on Characteristics of As-Te Chalcogenide Films Mochalov L, Nezhdanov A, Kudryashov M, Logunov A, Strikovskiy A, Gushchin M, Chidichimo G, De Filpo G, Mashin A Plasma Chemistry and Plasma Processing, 37(5), 1417, 2017 |