화학공학소재연구정보센터
검색결과 : 61건
No. Article
1 Reducing energy cost of NOx production in air plasmas
Pei XK, Gidon D, Yang YJ, Xiong ZL, Graves DB
Chemical Engineering Journal, 362, 217, 2019
2 Plasma Activated Organic Fertilizer
Graves DB, Bakken LB, Jensen MB, Ingels R
Plasma Chemistry and Plasma Processing, 39(1), 1, 2019
3 Hydrogen Plasmas Processing of Graphene Surfaces
Despiau-Pujo E, Davydova A, Cunge G, Graves DB
Plasma Chemistry and Plasma Processing, 36(1), 213, 2016
4 The Role of Interfacial Reactions in Determining Plasma-Liquid Chemistry
Anderson CE, Cha NR, Lindsay AD, Clark DS, Graves DB
Plasma Chemistry and Plasma Processing, 36(6), 1393, 2016
5 Platinum nanocluster growth on vertically aligned carbon nanofiber arrays: Sputtering experiments and molecular dynamics simulations
Brault P, Caillard A, Charles C, Boswell RW, Graves DB
Applied Surface Science, 263, 352, 2012
6 "SensArray" voltage sensor analysis in an inductively coupled plasma
Titus MJ, Hsu CC, Graves DB
Journal of Vacuum Science & Technology A, 28(1), 139, 2010
7 Study of ion and vacuum ultraviolet-induced effects on styrene- and ester-based polymers exposed to argon plasma
Bruce RL, Engelmann S, Lin T, Kwon T, Phaneuf RJ, Oehrlein GS, Long BK, Willson CG, Vegh JJ, Nest D, Graves DB, Alizadeh A
Journal of Vacuum Science & Technology B, 27(3), 1142, 2009
8 Silicon etch in the presence of a fluorocarbon overlayer: The role of fluorocarbon cluster ejection
Vegh JJ, Humbird D, Graves DB
Journal of Vacuum Science & Technology A, 26(1), 52, 2008
9 Molecular dynamics simulations of GaAs sputtering under low-energy argon ion bombardment
Despiau-Pujo E, Chabert P, Graves DB
Journal of Vacuum Science & Technology A, 26(2), 274, 2008
10 Wafer heating mechanisms in a molecular gas, inductively coupled plasma: in situ, real time wafer surface measurements and three-dimensional thermal modeling
Titus MJ, Graves DB
Journal of Vacuum Science & Technology A, 26(5), 1154, 2008