검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
The use of a Si-based resist system and Ti electrode for the fabrication of sub-10 nm metal-insulator-metal tunnel junctions Wada T, Haraichi S, Ishii K, Hiroshima H, Komuro M, Gorwadkar SM Journal of Vacuum Science & Technology A, 16(3), 1430, 1998 |
| 2 |
Electron-Beam Dot Lithography for Nanometer-Scale Tunnel-Junctions Using a Double-Layered Inorganic Resist Haraichi S, Wada T, Gorwadkar SM, Ishii K, Hiroshima H Journal of Vacuum Science & Technology B, 15(4), 1406, 1997 |