화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Low-temperature low-resistivity PEALD TiN using TDMAT under hydrogen reducing ambient
Caubet P, Blomberg T, Benaboud R, Wyon C, Blanquet E, Gonchond JP, Juhel M, Bouvet P, Gros-Jean M, Michailos J, Richard C, Iteprat B
Journal of the Electrochemical Society, 155(8), H625, 2008
2 X-ray metrology for advanced silicon processes
Wyon C, Gonchond JP, Delille D, Michallet A, Royer JC, Kwakman L, Marthon S
Applied Surface Science, 253(1), 21, 2006
3 In-line monitoring of advanced microelectronic processes using combined X-ray techniques
Wyon C, Delille D, Gonchond JP, Heider F, Kwakman L, Marthon S, Mazor I, Michallet A, Muyard D, Perino-Gallice L, Royer JC, Tokar A
Thin Solid Films, 450(1), 84, 2004
4 TiSi2 Integration in a Submicron CMOS Process .2. Integration Issues
Kalnitsky A, Brun N, Brun A, Gonchond JP
Journal of the Electrochemical Society, 142(6), 1992, 1995