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| No. | Article |
|---|---|
| 1 |
Exploring the ultimate resolution of positive-tone chemically amplified resists: 26 nm dense lines using extreme ultraviolet interference lithography Golovkina VN, Nealey PF, Cerrina F, Taylor JW, Solak HH, David C, Gobrecht J Journal of Vacuum Science & Technology B, 22(1), 99, 2004 |