화학공학소재연구정보센터
검색결과 : 9건
No. Article
1 Comparison of scanning capacitance microscopy measurements in open and closed loop modes on highly doped silicon monolayers
Goghero D, Gautier B, Descamps A, Bremond G, Faucher M, Mariolle D, Bertin F
Solid-State Electronics, 50(9-10), 1479, 2006
2 Structural and electrical properties of SiO2 films deposited on Si substrates from tetraethoxysilane/oxygen plasmas
Goghero D, Goullet A, Landesman JP
Solid-State Electronics, 49(3), 369, 2005
3 Effect of the ion bombardment energy on silicon dioxide films deposited from oxygen/tetraethoxysilane plasmas in a helicon reactor
Goghero D, Goullet A, Borvon G, Turban G
Thin Solid Films, 471(1-2), 123, 2005
4 Investigation of two-dimensional diffusion of the self-interstitials in crystalline silicon at 800 degrees C and at room temperature
Giannazzo F, Mirabella S, Priolo F, Goghero D, Raineri V
Journal of Vacuum Science & Technology B, 22(1), 369, 2004
5 Assessing the performance of two-dimensional dopant profiling techniques
Duhayon N, Eyber P, Fouchier M, Clarysee T, Vandervorst W, Alvarez D, Schoemann S, Ciappa M, Stangoni M, Fichtner W, Formanek P, Kittler M, Raineri V, Giannazzo F, Goghero D, Rosenwaks Y, Shikler R, Saraf S, Sadewasser S, Barreau N, Glatzel T, Verheijen M, Mentink SAM, von Sprekelsen M, Maltezopoulos T, Wiesendanger R, Hellemans L
Journal of Vacuum Science & Technology B, 22(1), 385, 2004
6 Simulation of scanning capacitance microscopy measurements on ultranarrow doping profiles in silicon
Giannazzo F, Goghero D, Raineri V, Mirabella S, Priolo F, Liotta SF, Rinaudo S
Journal of Vacuum Science & Technology B, 22(1), 394, 2004
7 Experimental aspects and modeling for quantitative measurements in scanning capacitance microscopy
Giannazzo F, Goghero D, Raineri V
Journal of Vacuum Science & Technology B, 22(5), 2391, 2004
8 Evaluation of the ion bombardment energy on silicon dioxide films deposited from O-2/TEOS plasmas on Si and unstrained Si0.83Ge0.17/Si substrates
Goghero D, Goullet A, Lebrizoual L, Meyer F, Turban G
Journal of Vacuum Science & Technology B, 20(6), 2281, 2002
9 Activation study of implanted N+ in 6H-SiC by scanning capacitance microscopy
Raineri V, Calcagno L, Giannazzo F, Goghero D, Musumeci F, Roccaforte F, La Via F
Materials Science Forum, 433-4, 375, 2002