화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Gas-efficient deposition of device-quality hydrogenated amorphous silicon using low gas flows and power modulated radio-frequency discharges
Biebericher ACW, van der Weg WF, Rath JK, Akdim MR, Goedheer WJ
Journal of Vacuum Science & Technology A, 21(1), 156, 2003
2 An alternative quantitative analysis of non-equilibrium transport coefficients in argon plasmas
Burm KTAL, Goedheer WJ, Schram DC
Plasma Chemistry and Plasma Processing, 22(3), 413, 2002