검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
An analysis of the TiN plasmachemical vapor deposition process based on optical emission spectroscopy measurements Peter S, Giegengack H, Richter F, Tabersky R, Konig U Thin Solid Films, 398-399, 343, 2001 |
| 2 |
Structure and Properties of Titanium Nitride Thin-Films Deposited at Low-Temperatures Using Direct-Current Magnetron Sputtering Elstner F, Ehrlich A, Giegengack H, Kupfer H, Richter F Journal of Vacuum Science & Technology A, 12(2), 476, 1994 |